• Process gas available
  • Vacuum
  • Powder processing
  • With high frequency generator
  • Painting / Plating
  • Adhesion / Bonding
  • Dispersion / Cohesion improvement
  • Cultivation / Dental Care
  • Cleaning / Sterilization
  • Etching
  • Thin film formation
  • Hydrophobic
  • Lipophobic / Stain repellency (under development)
  • Lipophilic (under development)
  • For experimental use
  • For manufacturing
  • Processing to special shapes (film, powder, tube, three-dimensional objects, etc.)

Rotary Benchtop Vacuum Plasma System YHS-DφS

Ideal for processing powders and chip capacitors! We have added a rotation mechanism to the vacuum plasma so that the entire surface can be processed at once!

Product Overview

High treatment effect for surface modification, cleaning, and hydrophilic treatment
Rotating chamber for batch processing of front and back
Powder surface treatment is possible in a dry environment
Cylindrical electrodes that can be rotated in the chamber
Discharge by applying a high frequency to the central electrode opposite the tubular electrode
The processing workpiece rolls in the rotating chamber and can be processed at once.
Cleaning of resin molded products, cleaning of MEMS pretreatment of adhesive molded products, powder surface treatment in dry environments, etc.
Etching, thin film formation, water repellency, redox of powders and small parts


Device name: Rotary benchtop vacuum plasma device
Model YHS-DφS
External dimensions 820mm(W)×600mm(D)×680mm(H)
Weight 100kg
Rotating part φ210×200mm(D)
Output adjustment
1 gas system (2 or more systems are optional)
Gas control method Needle valve (mass flow controller optional)
Pressure adjustment
Power supply 100V, 30A (50Hz/60Hz)