Process gas available
12 articles found.
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- Process gas available
- Atmospheric pressure (direct)
- Gas-less processing
- Painting / Plating
- Adhesion / Bonding
- Cleaning / Sterilization
- For manufacturing
- Processing to special shapes (film, powder, tube, three-dimensional objects, etc.)
Atmospheric Pressure Direct Plasma Film Crimping Machine D500-HR
Equipment capable of simultaneously processing two films by direct plasma using dielectric barrier discharge and immediately afterward thermo-compression bonding.
Atmospheric Pressure Direct Plasma Film Crimping Machine D500-HR
Equipment capable of simultaneously processing two films by direct plasma using dielectric barrier discharge and immediately afterward thermo-compression bonding.
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- Process gas available
- Vacuum
- Gas-less processing
- Thin film formation
- Hydrophobic
- For experimental use
Direct Vaporization – Thin Film Deposition Equipment DH-CVD
The industry’s first safe plasma CVD that directly deposits films from liquid raw materials.
Direct Vaporization – Thin Film Deposition Equipment DH-CVD
The industry’s first safe plasma CVD that directly deposits films from liquid raw materials.
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- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- For experimental use
- For manufacturing
Plasma etcher with heating mechanism CPE-200AHM
Etching of SiO2 and Si and ashing of organic matter can be achieved at high speed and high efficiency by heating.
Plasma etcher with heating mechanism CPE-200AHM
Etching of SiO2 and Si and ashing of organic matter can be achieved at high speed and high efficiency by heating.
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- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
- For manufacturing
Plasma Etcher Semi-Auto Series CPE-S Series
Hydrophilization of PTFE (Teflon). Water repellent treatment of various materials. Formation of a glass film. etc
Plasma Etcher Semi-Auto Series CPE-S Series
Hydrophilization of PTFE (Teflon). Water repellent treatment of various materials. Formation of a glass film. etc
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- Process gas available
- Vacuum
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Hydrophobic
- For experimental use
Desktop hydrophobic equipment YHS-Ω
Making materials hydrophobic. Waterproofing of cloth and paper, stain proofing, moisture proofing. Waterproofing of electronic parts, etc.
Desktop hydrophobic equipment YHS-Ω
Making materials hydrophobic. Waterproofing of cloth and paper, stain proofing, moisture proofing. Waterproofing of electronic parts, etc.
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- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
- For manufacturing
Plasma Etcher CPE Series
Etching of SiO2 and Si, etc. Fabrication of fine circuits such as semiconductor integrated circuits.
Plasma Etcher CPE Series
Etching of SiO2 and Si, etc. Fabrication of fine circuits such as semiconductor integrated circuits.
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- Process gas available
- Vacuum
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- For experimental use
Gas Introducing Vacuum Plasma System YHS-G
A vacuum plasma device capable of introducing various gases. Gas flow adjustment, power adjustment, vacuum degree monitor Precise processing conditions can be set. We will provide it in a low price range that is easy to introduce with simple one-touch operability ~ ♪ Surface treatment/ Treatment before thin film formation/ Treatment before anodic bonding/ Treatment before painting/ Other/ Also in the biotechnology and medical fields.
Gas Introducing Vacuum Plasma System YHS-G
A vacuum plasma device capable of introducing various gases. Gas flow adjustment, power adjustment, vacuum degree monitor Precise processing conditions can be set. We will provide it in a low price range that is easy to introduce with simple one-touch operability ~ ♪ Surface treatment/ Treatment before thin film formation/ Treatment before anodic bonding/ Treatment before painting/ Other/ Also in the biotechnology and medical fields.
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- Process gas available
- Vacuum
- With high frequency generator
- Thin film formation
- Hydrophobic
- Plasma durability test
- For manufacturing
Water-repellent coater CFC-550
Water repellent treatment using solid sources. A thin film of resin is formed on the surface. Reduced environmental impact. It can also be applied to other resins.
Water-repellent coater CFC-550
Water repellent treatment using solid sources. A thin film of resin is formed on the surface. Reduced environmental impact. It can also be applied to other resins.
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- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
Plasma Etcher CPE-B Series
Such as hydrophilization of Teflon surface and water repellency of nonwoven fabrics.
Plasma Etcher CPE-B Series
Such as hydrophilization of Teflon surface and water repellency of nonwoven fabrics.
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- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Hydrophobic
- For manufacturing
High-capacity vacuum plasma system SCB series
Mass processing with multi-stage electrodes. Compatible with various containers by changing the electrode structure. One-button operation is also possible. Ideal for production applications.
High-capacity vacuum plasma system SCB series
Mass processing with multi-stage electrodes. Compatible with various containers by changing the electrode structure. One-button operation is also possible. Ideal for production applications.
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- Hydrophobic / Lipophilic (under development)
- Hydrophobic / Lipophobic (under development)
- Painting / Plating
- Adhesion / Bonding
- Dispersion / Cohesion improvement
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
- For manufacturing
- Processing to special shapes (film, powder, tube, three-dimensional objects, etc.)