Hydrophobic

The industry’s first safe plasma CVD that directly deposits films from liquid raw materials.

Etching of SiO2 and Si and ashing of organic matter can be achieved at high speed and high efficiency by heating.

Complete line from unwind to rewind in the production processing section! Easy installation of your desired process. We can also accommodate any dimensions desired by the customer. Speed and tension can also be set as desired, allowing for a high degree of process flexibility.

Easy storage of images and contact angle data on the attached PC. Droplet volume can be controlled from 0.1μL. Still and moving images can be saved.

Hydrophilization of PTFE (Teflon). Water repellent treatment of various materials. Formation of a glass film. etc

Making materials hydrophobic. Waterproofing of cloth and paper, stain proofing, moisture proofing. Waterproofing of electronic parts, etc.

Etching of SiO2 and Si, etc. Fabrication of fine circuits such as semiconductor integrated circuits.

Water repellent treatment using solid sources. A thin film of resin is formed on the surface. Reduced environmental impact. It can also be applied to other resins.

Such as hydrophilization of Teflon surface and water repellency of nonwoven fabrics.

Mass processing with multi-stage electrodes. Compatible with various containers by changing the electrode structure. One-button operation is also possible. Ideal for production applications.