Hydrophobic
12 articles found.
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- Process gas available
- Vacuum
- Gas-less processing
- Thin film formation
- Hydrophobic
- For experimental use
Direct Vaporization – Thin Film Deposition Equipment DH-CVD
The industry’s first safe plasma CVD that directly deposits films from liquid raw materials.
Direct Vaporization – Thin Film Deposition Equipment DH-CVD
The industry’s first safe plasma CVD that directly deposits films from liquid raw materials.
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- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- For experimental use
- For manufacturing
Plasma etcher with heating mechanism CPE-200AHM
Etching of SiO2 and Si and ashing of organic matter can be achieved at high speed and high efficiency by heating.
Plasma etcher with heating mechanism CPE-200AHM
Etching of SiO2 and Si and ashing of organic matter can be achieved at high speed and high efficiency by heating.
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- Others (checkers, transfer equipment)
- Painting / Plating
- Thin film formation
- Hydrophobic
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
Roll to Roll Film Conveyor ROLL-15
Complete line from unwind to rewind in the production processing section! Easy installation of your desired process. We can also accommodate any dimensions desired by the customer. Speed and tension can also be set as desired, allowing for a high degree of process flexibility.
Roll to Roll Film Conveyor ROLL-15
Complete line from unwind to rewind in the production processing section! Easy installation of your desired process. We can also accommodate any dimensions desired by the customer. Speed and tension can also be set as desired, allowing for a high degree of process flexibility.
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- Others (checkers, transfer equipment)
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Thin film formation
- Hydrophobic
- For experimental use
Automatic Contact Angle Meter LSE-ME4
Easy storage of images and contact angle data on the attached PC. Droplet volume can be controlled from 0.1μL. Still and moving images can be saved.
Automatic Contact Angle Meter LSE-ME4
Easy storage of images and contact angle data on the attached PC. Droplet volume can be controlled from 0.1μL. Still and moving images can be saved.
-
- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
- For manufacturing
Plasma Etcher Semi-Auto Series CPE-S Series
Hydrophilization of PTFE (Teflon). Water repellent treatment of various materials. Formation of a glass film. etc
Plasma Etcher Semi-Auto Series CPE-S Series
Hydrophilization of PTFE (Teflon). Water repellent treatment of various materials. Formation of a glass film. etc
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- Process gas available
- Vacuum
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Hydrophobic
- For experimental use
Desktop hydrophobic equipment YHS-Ω
Making materials hydrophobic. Waterproofing of cloth and paper, stain proofing, moisture proofing. Waterproofing of electronic parts, etc.
Desktop hydrophobic equipment YHS-Ω
Making materials hydrophobic. Waterproofing of cloth and paper, stain proofing, moisture proofing. Waterproofing of electronic parts, etc.
-
- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
- For manufacturing
Plasma Etcher CPE Series
Etching of SiO2 and Si, etc. Fabrication of fine circuits such as semiconductor integrated circuits.
Plasma Etcher CPE Series
Etching of SiO2 and Si, etc. Fabrication of fine circuits such as semiconductor integrated circuits.
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- Process gas available
- Vacuum
- With high frequency generator
- Thin film formation
- Hydrophobic
- Plasma durability test
- For manufacturing
Water-repellent coater CFC-550
Water repellent treatment using solid sources. A thin film of resin is formed on the surface. Reduced environmental impact. It can also be applied to other resins.
Water-repellent coater CFC-550
Water repellent treatment using solid sources. A thin film of resin is formed on the surface. Reduced environmental impact. It can also be applied to other resins.
-
- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
Plasma Etcher CPE-B Series
Such as hydrophilization of Teflon surface and water repellency of nonwoven fabrics.
Plasma Etcher CPE-B Series
Such as hydrophilization of Teflon surface and water repellency of nonwoven fabrics.
-
- Process gas available
- Vacuum
- With high frequency generator
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- Hydrophobic
- For manufacturing
High-capacity vacuum plasma system SCB series
Mass processing with multi-stage electrodes. Compatible with various containers by changing the electrode structure. One-button operation is also possible. Ideal for production applications.
High-capacity vacuum plasma system SCB series
Mass processing with multi-stage electrodes. Compatible with various containers by changing the electrode structure. One-button operation is also possible. Ideal for production applications.
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- Hydrophobic / Lipophilic (under development)
- Hydrophobic / Lipophobic (under development)
- Painting / Plating
- Adhesion / Bonding
- Dispersion / Cohesion improvement
- Cultivation / Dental Care
- Cleaning / Sterilization
- Etching
- Thin film formation
- Hydrophobic
- Plasma durability test
- Lipophobic / Stain repellency (under development)
- Lipophilic (under development)
- For experimental use
- For manufacturing
- Processing to special shapes (film, powder, tube, three-dimensional objects, etc.)