Vacuum

The industry’s first safe plasma CVD that directly deposits films from liquid raw materials.

Etching of SiO2 and Si and ashing of organic matter can be achieved at high speed and high efficiency by heating.

Hydrophilization of PTFE (Teflon). Water repellent treatment of various materials. Formation of a glass film. etc

Making materials hydrophobic. Waterproofing of cloth and paper, stain proofing, moisture proofing. Waterproofing of electronic parts, etc.

Etching of SiO2 and Si, etc. Fabrication of fine circuits such as semiconductor integrated circuits.

A vacuum plasma device capable of introducing various gases. Gas flow adjustment, power adjustment, vacuum degree monitor Precise processing conditions can be set. We will provide it in a low price range that is easy to introduce with simple one-touch operability ~ ♪ Surface treatment/ Treatment before thin film formation/ Treatment before anodic bonding/ Treatment before painting/ Other/ Also in the biotechnology and medical fields.

It is compact and inexpensive. Surface treatment Treatment before thin film formation Treatment before anodic bonding Treatment before painting Other Also in the biotechnology and medical fields.

For surface modification and cleaning of plate, fibrous, and film-like objects. For gluing, printing and coating pretreatment. For the preparation of cell culture vessels (improves implantation and proliferative capacity). For sterilization of medical materials.

Water repellent treatment using solid sources. A thin film of resin is formed on the surface. Reduced environmental impact. It can also be applied to other resins.

Such as hydrophilization of Teflon surface and water repellency of nonwoven fabrics.