- Process gas available
- Vacuum
- Painting / Plating
- Adhesion / Bonding
- Cultivation / Dental Care
- Cleaning / Sterilization
- For experimental use
Gas Introducing Vacuum Plasma System YHS-G
A vacuum plasma device capable of introducing various gases. Gas flow adjustment, power adjustment, vacuum degree monitor Precise processing conditions can be set. We will provide it in a low price range that is easy to introduce with simple one-touch operability ~ ♪ Surface treatment/ Treatment before thin film formation/ Treatment before anodic bonding/ Treatment before painting/ Other/ Also in the biotechnology and medical fields.
Options
■Multiple gas introductions
■Scale stage size
■RF Type
The above optional fee is available. Please contact us for details.
Specification
Item Name:YHS-G
Dimensions (mm): 562(W)×562(D)×360(H)
Stage dimension (mm): φ100~