• Process gas available
  • Vacuum
  • Painting / Plating
  • Adhesion / Bonding
  • Cultivation / Dental Care
  • Cleaning / Sterilization
  • For experimental use

Gas Introducing Vacuum Plasma System YHS-G

A vacuum plasma device capable of introducing various gases. Gas flow adjustment, power adjustment, vacuum degree monitor Precise processing conditions can be set. We will provide it in a low price range that is easy to introduce with simple one-touch operability ~ ♪ Surface treatment/ Treatment before thin film formation/ Treatment before anodic bonding/ Treatment before painting/ Other/ Also in the biotechnology and medical fields.

Options

■Multiple gas introductions
■Scale stage size
■RF Type
The above optional fee is available. Please contact us for details.

Specification

Item Name:YHS-G
Dimensions (mm): 562(W)×562(D)×360(H)
Stage dimension (mm): φ100~