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Our article was published in The Nikkan Kogyo Shimbun.

Tuesday, September 20, 2022 Nikkan Kogyo Shimbun, page 13


“Sakigake Semiconductors New Plasma CVD Technology Improves Film Deposition Efficiency and Safety”


New technology newly developed by our company for direct film formation from liquid raw materials
“Direct Vaporization Type – Thin Film Deposition “DH-CVD (Direct Humidity – Chemical Vapor Deposition)”and
A new product “Direct vaporization type – thin film deposition device “DH-CVD” using this technology is introduced.

I hope you can take a look.


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