Introducing the Industry’s First High-Performance AC High Voltage Power Supply for Compact Vacuum Plasma Systems: The PKM-VP20, Now with Power Monitoring

Hydrogen-free reduction of oxidized metal parts Direct vaporization type reduction device “DH-Reduction” released on January 20

Industry’s first accurate control of liquids of 1 μl or less Developed a new technology to improve liquid drainage in containers Plasma contract processing at a new factory

Notice of Start of Construction of New Factory “20th Anniversary Commemorative Building” to be a base for new businesses to start next spring

Donation of books to Kyoto Institute of Technology

Introducing The Industry’s First New CVD Technology For Safe Film Deposition Using Liquid Materials. The Direct Vaporization Thin Film Deposition System, ‘DH-CVD’, Is Set To Be Released On September 21.

We Have Developed An Industry-First Special Plasma Processing Technology That Activates PTFE Powder Dispersed In Liquid. This Innovative Approach Has Led To The Development Of New Materials For Applications Such As Paints And 3D Printers.

We Have Developed The “Flip-Flop Coater FFC-400M”, A Vacuum Plasma Device That Marks The Industry’s First Practical Application Of Achieving Repeated Water-Repellent And Hydrophilic Effects In A Dry Process.